Fundamentals and Present Aspects of Ion Beam Technology. V. Application of Ion Beam. 3. Application of Industries. 3.4 Ion beam etching.
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چکیده
منابع مشابه
Ion beam induced dry etching and possibility of highly charged ion beam
Dry etching techniques employing ion beam induced surface reaction and the possibility of highly charged ion beam in dry etching are described, and the preliminary work on dry etching of GaAs using highly charged ion (HCI) is also presented. In usual dry etching, total etch rate is a summation of the physical sputtering rate, the chemical etching rate, and the ion-induced chemical etching rate....
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............................................................................................................... 3 43 PREFACE .................................................................................................................... 4 44 MAIN POINTS ............................................................................................................ 6 45 GLOSSARY ..................
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ژورنال
عنوان ژورنال: RADIOISOTOPES
سال: 1995
ISSN: 1884-4111,0033-8303
DOI: 10.3769/radioisotopes.44.9_673